Fused Quartz Furnace Door

Applications‌

1. ‌Semiconductor Manufacturing‌

   :Used in high-temperature process chambers‌

    (e.g., diffusion furnaces, CVD/PVD systems) to seal openings while maintaining thermal and chemical stability‌14.

• Protects sensitive components from contamination during ‌wafer annealing‌, ‌oxidation‌, and ‌thin-film deposition‌

‌Photovoltaic Production‌:Ensures airtight sealing in ‌solar cell fabrication‌ for processes like dopant diffusion and anti-reflective coating deposition‌

2. ‌Laboratory Research‌

   :Employed in ‌high-purity material synthesis‌ and thermal analysis systems requiring transparent, non-reactive barriers‌

Physical Properties‌

1. ‌Material Composition‌

2. Made of high-purity synthetic quartz‌

    (SiO₂ > 99.99%) with a single-crystal or polycrystalline structure‌
   

   ‌Thermal Performance‌
• ‌Melting Point‌

  : ~1670°C, suitable for sustained operation up to ‌1200°C‌

• ‌Low Thermal Expansion‌: Maintains structural integrity under rapid temperature cycling.

3. ‌Chemical Resistance‌