CVD Synthetic Quartz Glass Ingot

‌1. Optical Transmittance‌

· ‌Ultraviolet (UV) Range (165–400 nm)‌:

· Transmits ‌>80% at 185 nm‌, enabling high-efficiency UV applications such as photolithography and sterilization systems‌23.

· Maintains ‌>90% transmittance‌ across the UV spectrum (200–400 nm)‌23.

· ‌Visible Light (400–700 nm)‌:

· Achieves ‌>93% transmittance‌ with minimal scattering, ideal for precision optical components‌23.

· ‌Infrared (IR) Range (700–3000 nm)‌:

· Provides moderate IR transmission for thermal imaging and laser optics‌3.

‌2. Primary Applications‌

· ‌Semiconductor Manufacturing‌:

· Used as ‌diffusion furnace tubes‌ for high-temperature wafer processing due to thermal stability and chemical inertness‌13.

· Serves as a base material for CVD reactors to deposit high-purity silica layers‌1.

· ‌Optical Component Fabrication‌:

· Processed into lenses, prisms, and mirrors for microscopes, telescopes, and laser systems‌23.

· ‌UV Technology‌:

· Critical for manufacturing UV sterilization lamps, photolithography masks, and ozone-generating devices‌23.

· ‌Telecommunications‌:

· Forms ‌fiber preforms‌ for low-loss optical fibers in high-speed data transmission‌3.

· ‌High-Temperature Industrial Processes‌:

· Utilized in chemical reactors and aerospace components for thermal shock resistance (>1000°C)‌13.

‌3. Material Advantages‌

· ‌High Purity‌: Synthesized via CVD methods with ‌>99.99% SiO₂‌, minimizing impurities that affect optical performance‌12.

· ‌Surface Morphology Control‌: Engineered surface structures optimize deposition rates in CVD processes‌1.

· ‌Chemical and Thermal Resistance‌: Resists acids, alkalis, and extreme temperatures for long-term durability‌13.

‌Note‌: Synthetic silica glass ingots are foundational materials in industries requiring ultra-high purity, tailored optical transmittance, and robust performance in harsh environments‌1