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Quartz Glass FlangeQuartz Glass Flange - Technical Specifications High-purity fused silica flanges engineered for extreme thermal, chemical, and optical applications in semiconductor, photovoltaic, and high-temperature processing systems13. Core Material Properties Material Composition Ultra-High Purity: SiO₂ >99.99% with metallic impurities <0.1 ppm13. Thermal Resilience: Continuous operation up to 1,250°C; softening point 1,730°C12. Optical Clarity: >93% visible light transmission; >85% UV transmission (190-400 nm)12. Physical Specifications Parameter Value Outer Diameter 1.5–450 mm (customizable)16 Thickness Range 0.5–10 mm1 Thermal Shock ΔT ≥850°C (air-to-air)26 Surface Finish Fire-polished (Ra ≤0.5μm) or sandblasted frosted6 Key Features Chemical Resistance: Inert to HF, aqua regia, and organic solvents with ≤0.05 ppm ion leaching13. Electrical Insulation: Ideal for high-voltage environments14. Vacuum Compatibility: Hermetic sealing for CVD/PVD systems35. Connection Types: Standard flat-face or custom grooved designs35. Applications Semiconductor Manufacturing: Diffusion furnace components, wafer supports14. Photovoltaic Systems: Solar cell processing chambers1. Analytical Instrumentation: Spectroscopy windows, reactor sealing35. Industrial Heating: Molten salt reactors, high-purity gas lines26. Customization Options Perforated Designs: Precise hole patterns for gas distribution6. Sandblasted Frosting: Non-slip surfaces or labeling zones6. Edge Treatments: Chamfered, laser-cut, or fire-polished edges16. Specialized Coatings: Anti-reflective or conductive layers4. ⚠️ Critical Handling Protocols Thermal Cycling: Limit ramp rates to ≤10°C/min above 600°C13. Cleaning: Use SC1 solution (NH₄OH₂O₂₂O 1:1:5) or semiconductor-grade solvents16. Installation: Avoid mechanical over-torque; apply uniform pressure on sealing surfaces35. Certified for RoHS/REACH compliance and ISO 9001 manufacturing standards
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