Fused Silica Glass Flange

Quartz Glass Flange - Technical Specifications

High-purity fused silica flanges engineered for extreme thermal, chemical, and optical applications in semiconductor, photovoltaic, and high-temperature processing systems13.

Core Material Properties

‌Material Composition‌

‌Ultra-High Purity‌: SiO₂ >99.99% with metallic impurities <0.1 ppm13.

‌Thermal Resilience‌: Continuous operation up to 1,250°C; softening point 1,730°C12.

‌Optical Clarity‌: >93% visible light transmission; >85% UV transmission (190-400 nm)12.

‌Physical Specifications‌

Parameter‌ ‌Value‌

‌Outer Diameter‌ 1.5–450 mm (customizable)16

‌Thickness Range‌ 0.5–10 mm1

‌Thermal Shock ΔT‌ ≥850°C (air-to-air)26

‌Surface Finish‌ Fire-polished (Ra ≤0.5μm) or sandblasted frosted6

Key Features

‌Chemical Resistance‌: Inert to HF, aqua regia, and organic solvents with ≤0.05 ppm ion leaching13.

‌Electrical Insulation‌: Ideal for high-voltage environments14.

‌Vacuum Compatibility‌: Hermetic sealing for CVD/PVD systems35.

‌Connection Types‌: Standard flat-face or custom grooved designs35.

Applications

‌Semiconductor Manufacturing‌: Diffusion furnace components, wafer supports14.

‌Photovoltaic Systems‌: Solar cell processing chambers1.

‌Analytical Instrumentation‌: Spectroscopy windows, reactor sealing35.

‌Industrial Heating‌: Molten salt reactors, high-purity gas lines26.

Customization Options

‌Perforated Designs‌: Precise hole patterns for gas distribution6.

‌Sandblasted Frosting‌: Non-slip surfaces or labeling zones6.

‌Edge Treatments‌: Chamfered, laser-cut, or fire-polished edges16.

‌Specialized Coatings‌: Anti-reflective or conductive layers4.

⚠️ ‌Critical Handling Protocols‌

‌Thermal Cycling‌: Limit ramp rates to ≤10°C/min above 600°C13.

‌Cleaning‌: Use SC1 solution (NH₄OH₂O₂₂O 1:1:5) or semiconductor-grade solvents16.

‌Installation‌: Avoid mechanical over-torque; apply uniform pressure on sealing surfaces35.

Certified for RoHS/REACH compliance and ISO 9001 manufacturing standards